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Investigation of defect levels in Mg-doped GaN Schottky structures by thermal admittance spectroscopy

机译:通过热导率光谱研究掺镁GaN肖特基结构中的缺陷水平

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摘要

Schottky structures based on Mg-doped GaN layers grown by metalorganic chemical vapor deposition (MOCVD) on sapphire substrate are studied by thermal admittance spectroscopy from 90 K to room temperature. Evidence of two impurity levels results from the analysis of the observed peaks in the conductance curves, whose positions and strengths are temperature dependent. The experimental results are analyzed within a detailed theoretical study of the steady-state and small-signal electrical characteristics of the structure. Numerical simulations are based on the solution of the basic semiconductor equations for the structure consisting of two Schottky diodes connected back-to-back by a conduction channel formed by the GaN layer.
机译:通过在90 K到室温之间的热导率光谱研究了基于通过金属有机化学气相沉积(MOCVD)在蓝宝石衬底上生长的Mg掺杂GaN层的肖特基结构。通过分析电导曲线中观察到的峰可以得出两个杂质水平的证据,这些峰的位置和强度与温度有关。在对结构的稳态和小信号电特性进行详细的理论研究后,对实验结果进行了分析。数值模拟基于基本半导体方程的求解,该基本半导体方程的结构由两个GaN层形成的导电沟道背对背连接的肖特基二极管组成。

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